Initiated-Chemical Vapor Deposition of Polymer Thin Films: Unexpected Two-Regime Growth-Reference-Cited by-同舟云学术

Initiated-Chemical Vapor Deposition of Polymer Thin Films: Unexpected Two-Regime Growth

Published:2017-10-11 Issue:12 Volume:302 Page:1700315
ISSN:1438-7492
Container-title:Macromolecular Materials and Engineering
language:en
Short-container-title:Macromol. Mater. Eng.

Author:

Bonnet Laetitia¹²³,Altemus Bruce⁴,Scarazzini Riccardo¹²,Veillerot Marc¹²,D'Agosto Franck³,Faguet Jacques⁵,Jousseaume Vincent¹²

Affiliation:

1. Université Grenoble Alpes; 38000 Grenoble France

2. CEA; LETI; MINATEC Campus; 38054 Grenoble France

3. Université de Lyon; Univ Lyon 1; CPE Lyon; CNRS; UMR 5265; C2P2 (Chemistry, Catalysis, Polymers & Processes); Team LCPP, Bat 308F, 43 Bd du 11 Novembre 1918 69616 Villeurbanne France

4. US-Technology Development Center; TEL Technology Center; America, LLC, 255 Fuller RoadSuite 214 Albany NY 12203 USA

5. US-Technology Development Center; TEL Technology Center; America, LLC2400 Grove Blvd. Austin TX 78741 USA

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Organic Chemistry,General Chemical Engineering

Reference43 articles.

1. Dielectric Films for Advanced Microelectronics

2. Plasma Polymer Films

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