Humidity‐Controlled Molecular Assembly and Photoisomerization Behavior with a Bubble‐Assisted Patterning Approach

Abstract

AbstractPrecise control of molecular assembly is of great significance in the application of functional molecules. This work has systematically investigated the humidity effect in bubble‐assisted molecular assembly. This work finds humidity is critical in the evolution of the soft confined space, leading to the formation of microscale liquid confined space under high humidity, and nanoscale liquid confined space under low humidity. It is also revealed that the differences in surface wettability and adhesion play the key role. Consequently, a flat pattern with thermodynamically favorable ordered structure and a sharp pattern with dynamically favorable disordered structure are achieved, which show different solid‐state photoisomerization behaviors and photoresponsiveness. Interestingly, conductivity of sharp pattern with disordered structure is higher than that of flat pattern with layered ordered structure due to electronic transport mechanism of different spatial dimensions. This work opens a new way for manipulating the molecular self‐assembly to control the morphology and function of molecular patterns.