Tuning Electrons Migration of Dual S Defects Mediated MoS2‐x/ZnIn2S4‐x Toward Highly Efficient Photocatalytic Hydrogen Production

Author:

Zheng Yifan12,Wang Yu13,Mansoor Seemal12,Hu Zixu13,Zhang Yuxin13,Liu Yongdi3,Zhou Liang13456,Lei Juying135,Zhang Jinlong12ORCID

Affiliation:

1. Shanghai Engineering Research Center for Multi‐media Environmental Catalysis and Resource Utilization East China University of Science and Technology 130 Meilong Road Shanghai 200237 P. R. China

2. Key Laboratory for Advanced Materials and Joint International Research Laboratory of Precision Chemistry and Molecular Engineering Feringa Nobel Prize Scientist Joint Research Center School of Chemistry and Molecular Engineering East China University of Science and Technology 130 Meilong Road Shanghai 200237 P. R. China

3. National Engineering Research Center of Industrial Wastewater Detoxication and Resource Recovery School of Resources and Environmental Engineering East China University of Science and Technology 130 Meilong Road Shanghai 200237 P. R. China

4. Department of Molecular Engineering Kyoto University Kyoto‐Daigaku Katsura, Nishikyo‐ku Kyoto 615‐8510 Japan

5. Shanghai Institute of Pollution Control and Ecological Security Shanghai 200092 P. R. China

6. State Key Laboratory of Urban Water Resource and Environment Harbin Institute of Technology Harbin 150090 P. R. China

Abstract

AbstractPhotocatalytic hydrogen production is a prevalent method for hydrogen synthesis. However, high recombination rate of photogenerated carriers and high activation energy barrier of H remain persistent challenge. Here, the two‐step hydrothermal method is utilized to prepare dual S‐defect mediated catalyst molybdenum sulfide/zinc indium sulfide (MSv/ZISv), which has high hydrogen production rate of 8.83 mmol g−1h−1 under simulated sunlight. The achieved rate is 21.91 times higher than pure ZnIn2S4 substrate. Defects in ZIS within MSv/ZISv modify the primitive electronic structure by creating defect state that retaining good reducing power, leading to the rapid separation of electron‐hole pairs and the generation of additional photogenerated carriers. The internal electric field further enhances the migration toward to cocatalyst. Simultaneously, the defects introduced on the MoS2 cause electron rearrangement, leading to electron clustering on both S vacancies and edge S. Thereby MSv/ZISv exhibits the lowest activation energy barrier and |ΔGH*|. This work explores the division of synergies between different types of S defects, providing new insights into the coupling of defect engineering.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Science and Technology Commission of Shanghai Municipality

Fundamental Research Funds for the Central Universities

Publisher

Wiley

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