Electrical Contacts With 2D Materials: Current Developments and Future Prospects

Author:

Batool Saima1,Idrees Muhammad2,Han Su‐Ting3,Roy Vellaisamy A. L.4,Zhou Ye1ORCID

Affiliation:

1. Institute for Advanced Study Shenzhen University Shenzhen 518060 P. R. China

2. Additive Manufacturing Institute College of Mechatronics and Control Engineering Shenzhen University Shenzhen 518060 P. R. China

3. College of Electronics Science & Technology Shenzhen University Shenzhen 518060 P. R. China

4. James Watt School of Engineering University of Glasgow Glasgow G12 8QQ UK

Abstract

AbstractCurrent electrical contact models are occasionally insufficient at the nanoscale owing to the wide variations in outcomes between 2D mono and multi‐layered and bulk materials that result from their distinctive electrostatics and geometries. Contrarily, devices based on 2D semiconductors present a significant challenge due to the requirement for electrical contact with resistances close to the quantum limit. The next generation of low‐power devices is already hindered by the lack of high‐quality and low‐contact‐resistance contacts on 2D materials. The physics and materials science of electrical contact resistance in 2D materials‐based nanoelectronics, interface configurations, charge injection mechanisms, and numerical modeling of electrical contacts, as well as the most pressing issues that need to be resolved in the field of research and development, will all be covered in this review.

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

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