Influence of rapid thermal annealing on structure and interfacial characteristic of ZnO thin films-Reference-Cited by-同舟云学术

Influence of rapid thermal annealing on structure and interfacial characteristic of ZnO thin films

Published:2012-07-20 Issue:2 Volume:45 Page:672-676
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Meng Xiangqin¹,Yang Chengtao¹,Fu Wujun¹,Xie Quntiao¹,Chen Qingqing¹

Affiliation:

1. State Key Laboratory of Electronic Thin Films and Integrated Devices; University of Electronic Science and Technology of China; Chengdu 610054 China

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.5129/fullpdf

Reference30 articles.

1. A comprehensive review of ZnO materials and devices

2. Correlation between the defect structure and the residual stress distribution in ZnO visualized by TEM and Raman microscopy

3. Initial preferred growth in zinc oxide thin films on Si and amorphous substrates by a pulsed laser deposition

4. Photoluminescence study of ZnO nanorods epitaxially grown on sapphire (112̄0) substrates

5. Characteristics of dislocations in ZnO layers grown by plasma-assisted molecular beam epitaxy under different Zn∕O flux ratios

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