Doping Effects in CMOS‐compatible CoSi Thin Films for Thermoelectric and Sensor Applications-Reference-Cited by-同舟云学术

Doping Effects in CMOS‐compatible CoSi Thin Films for Thermoelectric and Sensor Applications

Published:2020-06-10 Issue:14 Volume:646 Page:1231-1237
ISSN:0044-2313
Container-title:Zeitschrift für anorganische und allgemeine Chemie
language:en
Short-container-title:Z. Anorg. Allg. Chem.

Author:

Krishna Nichenametla Charan¹,Calvo Jesus¹,Riedel Stefan¹,Gerlich Lukas¹,Hindenberg Meike¹,Novikov Sergej²,Burkov Alexander²,Kozelj Primož³,Cardoso‐Gil Raul³,Wagner‐Reetz Maik¹

Affiliation:

1. Fraunhofer Institut für Photonische Mikrosysteme Koenigsbruecker Strasse 178 01099 Dresden Germany

2. Ioffe Institute, Russian Academy of Sciences 194021 St. Petersburg Russia

3. Max‐Planck‐Institut für Chemische Physik fester Stoffe Noethnitzer Strasse 40 01187 Dresden Germany

Funder

Horizon 2020 Framework Programme

Publisher

Wiley

Subject

Inorganic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/zaac.202000084

Reference24 articles.

1. New thermoelectric components using microsystem technologies

2. Fabrication of Thin-Film Silicon Membranes With Phononic Crystals for Thermal Conductivity Measurements

3. Miniaturized thermoelectric generators based on poly-Si and poly-SiGe surface micromachining

4. Enhanced thermoelectric figure of merit in nanostructured n-type silicon germanium bulk alloy

5. Enhanced Thermoelectric Figure-of-Merit in Nanostructured p-type Silicon Germanium Bulk Alloys

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