P-55: Process Development of Integrated Vcom and PAS using Wet Etching Bias Control for High Resolution UHD AH-IPS TFT-LCD-Reference-Cited by-同舟云学术

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P-55: Process Development of Integrated Vcom and PAS using Wet Etching Bias Control for High Resolution UHD AH-IPS TFT-LCD

Published:2015-06 Issue:1 Volume:46 Page:1348-1351
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:

Author:

Kwack Heeyoung¹,Kim Eungyong¹,Park Chulho¹,Nam Myungwoo¹,Yu Sangjeon¹,Park Jongwook¹,Shin Sangmun¹

Affiliation:

1. LG Display Co., Ltd, Paju, KOREA

Publisher

Wiley

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sdtp.10122/fullpdf

Reference7 articles.

1. Display Innovation 2014

2. T. Tsukada TFT & LCD 1994

3. G. Lavareda C. Nunes de Carvalho A. Amaral Materials Science and Engineering 264 268 2004

4. Jui-Sheng Chou Yian Tai Lian-Ji Chang Int. J. Production Economics 339 350 2010

5. M. Katayama Thin Solid Films 140 147 1999

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1. 81-2: Innovative Mask Reduction Process for High Resolution TFT LCDs using Organic Dielectrics;SID Symposium Digest of Technical Papers;2016-05

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