Non-destructive depth analysis of the surface oxide layer on Mg2 Si with XPS and XAS-Reference-Cited by-同舟云学术

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Non-destructive depth analysis of the surface oxide layer on Mg2 Si with XPS and XAS

Published:2016-01-22 Issue:7 Volume:48 Page:432-435
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Esaka Fumitaka¹,Nojima Takehiro¹,Udono Haruhiko²,Magara Masaaki¹,Yamamoto Hiroyuki¹

Affiliation:

1. Japan Atomic Energy Agency; 2-4 Shirakata, Tokai Naka Ibaraki 319-1195 Japan

2. Ibaraki University; 4-12-1 Nakanarusawa Hitachi Ibaraki 316-8511 Japan

Funder

JSPS KAKENHI

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.5939/fullpdf

Reference17 articles.

1. Angle-resolved x-ray photoelectron spectroscopy

2. Profiling nitrogen in ultrathin silicon oxynitrides with angle-resolved x-ray photoelectron spectroscopy

3. Depth profiling of surface oxidized TiAlN film by synchrotron radiation excited X-ray photoelectron spectroscopy

4. X-ray photoelectron and X-ray absorption spectroscopic study on β-FeSi2 thin films fabricated by ion beam sputter deposition

5. Spectroscopic characterization of β-FeSi2 single crystals and homoepitaxial β-FeSi2 films by XPS and XAS

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1. Efficiently nucleophilic trifluoromethylation of aldehydes over MgSO4/ZrO2 catalyst;Molecular Catalysis;2024-03

2. Thick p-type Mg2Si film on Si: Growth, structure and transport properties;Journal of Alloys and Compounds;2023-11

3. Optimization of Mn‐Mg‐Al Mixed Oxides Composition on their Activity towards the Total Oxidation of Aromatic and Oxygenated VOCs;European Journal of Inorganic Chemistry;2023-05-12

4. Effects of Oxygen on Lattice Defects in Single-Crystalline Mg2Si Thermoelectrics;Nanomaterials;2023-03-30

5. Purifying Metallurgical-Grade Silicon to 4N with 3D Porous Structure by Integrated Metallurgy-Materials Phase Separation;Chemical Engineering Journal;2023-02

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