Quantification of hard X‐ray photoelectron spectroscopy: Calculating relative sensitivity factors for 1.5‐ to 10‐keV photons in any instrument geometry-Reference-Cited by-同舟云学术

Quantification of hard X‐ray photoelectron spectroscopy: Calculating relative sensitivity factors for 1.5‐ to 10‐keV photons in any instrument geometry

Published:2022-01-11 Issue: Volume: Page:
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surface & Interface Analysis

Author:

Cant David J. H.¹^ORCID,Spencer Ben F.²,Flavell Wendy R.³,Shard Alexander G.¹^ORCID

Affiliation:

1. National Physical Laboratory Teddington UK

2. Henry Royce Institute and the Department of Materials, School of Natural Sciences The University of Manchester Manchester UK

3. Henry Royce Institute, Photon Science Institute, and Department of Physics and Astronomy, School of Natural Sciences The University of Manchester Manchester UK

Funder

Henry Royce Institute

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sia.7059

Reference50 articles.

1. A system for the intensity calibration of electron spectrometers

2. Quantitative XPS

3. Practical expressions for the mean escape depth, the information depth, and the effective attenuation length in Auger-electron spectroscopy and x-ray photoelectron spectroscopy

4. Simple universal curve for the energy-dependent electron attenuation length for all materials

5. Surface sensitivity of X-ray photoelectron spectroscopy

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