Enhancing the Emission Rate of the Inherent Silicon‐Vacancy Center Using Optimized Multipolar Moments in a Silicon Carbide Metasurface

Author:

Vashist Vivek1,Khokhar Megha1,Inam Faraz A.2,Nair Rajesh V.1ORCID

Affiliation:

1. Laboratory for Nano‐scale Optics and Meta‐materials (LaNOM) Department of Physics Indian Institute of Technology Ropar Punjab 140001 India

2. Department of Physics Aligarh Muslim University Aligarh Uttar Pradesh 202002 India

Abstract

AbstractSilicon carbide (SiC) hosts various color centers with emission lines from visible to near‐infrared, with promising applications in quantum communication. Metasurfaces made using SiC can enhance the emission rate of inherent color centers to achieve on‐demand single photon emission with a high emission rate. This is possible by engineering the amplitude and phase of the excited multipolar scattering moments in metasurfaces. The numerical simulations and analytical calculations are used to study the emission rate enhancement from an embedded single silicon vacancy () center in SiC metasurface. The optimized metasurface balances multipolar moments at the zero‐phonon line wavelength of 862 nm with 40 times field intensity confinement. The confinement provides substantial emission rate enhancement for the center, making it a bright single photon emitter at 862 nm. The significant emission enhancement offers new insights into the metasurface to achieve on‐demand single‐photon sources and efficient spin–photon interfaces.

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Computational Theory and Mathematics,Condensed Matter Physics,Mathematical Physics,Nuclear and High Energy Physics,Electronic, Optical and Magnetic Materials,Statistical and Nonlinear Physics

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