9‐3: Performance of New Gen. 6 Exposure Tools for 1.2 μm Resolution-Reference-Cited by-同舟云学术

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9‐3: Performance of New Gen. 6 Exposure Tools for 1.2 μm Resolution

Published:2021-05 Issue:1 Volume:52 Page:99-102
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:SID Symposium Digest of Technical Papers

Author:

Yabu Nobuhiko¹,Hakko Manabu¹,Okubo Toru¹,Oyanagi, Takeo¹,Ando Miwako¹,Terashi Takaaki¹,Izumi Nozomu¹,Osaki Yoshinori¹

Affiliation:

1. Canon Inc. Tochigi Japan

Publisher

Wiley

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.14620

Reference8 articles.

1. Complete analysis of a two-mirror unit magnification system. Part 1;Suzuki A;Applied Optics,1983

2. Catadioptric projection optical system for flat panel exposure tool;Kohno M;Proc. SPIE 6342, International Optical Design Conference 2006,2006

3. High-resolution technology for FPD manufacturing;Yabu N;J Soc Inf Display,2015

4. Development of G6 exposure tool for 1.2 μm resolution;Nagano K;J Soc Inf Display,2019

5. New Gen. 6 Exposure Tools for 1.2 μm Resolution;Yabu N;SID 2020 DIGEST,2020

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