Alkaline‐developable and negative‐type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo‐base generator
Author:
Affiliation:
1. Department of Molecular Science and Engineering National Taipei University of Technology Taipei Taiwan
2. Department of Chemical Engineering National Taiwan University Taipei Taiwan
Funder
Ministry of Education
Ministry of Science and Technology, Taiwan
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Physical and Theoretical Chemistry
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/pol.20200409
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