Oxygen removal from raw silicon powder by the HF-ethanol solution etching-Reference-Cited by-同舟云学术

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Oxygen removal from raw silicon powder by the HF-ethanol solution etching

Published:2012-11-20 Issue:6 Volume:45 Page:955-961
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Pan Kunming¹,Zhang Laiqi¹,Wang Jue¹,Lin Junpin¹,Chen Guoliang¹

Affiliation:

1. State Key Laboratory for Advanced Metals and Materials; University of Science and Technology Beijing; Beijing; 100083; China

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference28 articles.

1. Reversible Cycling of Crystalline Silicon Powder

2. Shock-induced chemical reactions in titanium–silicon powder mixtures of different morphologies: Time-resolved pressure measurements and materials analysis

3. Processing of powder surfaces by ion beam techniques

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1. Development of novel multi-selective slurry with mechanically driven etching for through silicon via chemical mechanical polishing;Materials Science in Semiconductor Processing;2022-12

2. Cooperative defect-enriched SiO2 for oxygen activation and organic dehydrogenation;Journal of Catalysis;2019-08

3. Dislocation climb in Mo 5 SiB 2 during high-temperature deformation;International Journal of Refractory Metals and Hard Materials;2016-12

4. BRITTLE-TO-DUCTILE TRANSITION FOR T2 IN THE Mo-Si-B SYSTEM;Acta Metallurgica Sinica;2013

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