Fabrication and characterization of GaN‐based distributed Bragg reflector mirrors for low lasing threshold and integrated photonics
Author:
Affiliation:
1. Department of Electronic Science and Engineering, Kyoto University, Kyoto, 615‐8510, Japan
2. Nitride Semiconductor Research Laboratory, Nichia Corporation, 491 Oka Kaminaka Anan, Tokushima, 774‐8601, Japan
Publisher
Wiley
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssc.200461543
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Enhancing the Light-Extraction Efficiency of an AlGaN Nanowire Ultraviolet Light-Emitting Diode by Using Nitride/Air Distributed Bragg Reflector Nanogratings;IEEE Photonics Journal;2017-10
2. Design of Fabry-Perot filters in planar waveguides with deep-etched features for spatial switching;Optics Express;2009-09-17
3. Surface charge lithography for GaN micro- and nanostructuring;SPIE Proceedings;2009-02-12
4. Influence of patterned TiO 2 /SiO 2 dielectric multilayers for back and front mirror facets on GaN-based laser diodes;Chinese Physics B;2008-09
5. Study and formation of 2D microstructures of sapphire by focused ion beam milling;Microelectronic Engineering;2008-03
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