Fabrication of nanocrystal memories by ultra low energy ion implantation-Reference-Cited by-同舟云学术

Fabrication of nanocrystal memories by ultra low energy ion implantation

Published:2005-04 Issue:6 Volume:2 Page:1907-1911
ISSN:1610-1634
Container-title:physica status solidi (c)
language:en
Short-container-title:phys. stat. sol. (c)

Author:

Cherkashin N.¹²,Bonafos C.¹,Coffin H.¹,Carrada M.¹,Schamm S.¹,Ben Assayag G.¹,Chassaing D.¹,Dimitrakis P.³,Normand P.³,Perego M.⁴,Fanciulli M.⁴,Muller T.⁵,Heinig K. H.⁵,Claverie A.¹

Affiliation:

1. CEMES‐CNRS, 29 rue J. Marvig, 31055, Toulouse, France

2. Ioffe Physico‐Technical Institute, Polytekhnicheskaya 26, St Petersburg 194021, Russia

3. Institute of Microelectronics, NCSR 'Demokritos', 15310 Aghia Praskevi, Greece

4. Laboratorio MDM ‐ INFM Agrate, Italy

5. Forschungszentrum Rossendorf, Institut für Ionenstrahlphysik und Materialforschung, PO Box 510119, 01314 Dresden, Germany

Publisher

Wiley

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssc.200460523

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