1. H. Ryssel and I. Ruge, Ion Implantation (Wiley, New York, 1986).
2. A. Rosencwaig, in: Photoacoustic and Thermal Wave Phenomena in Semiconductors, edited by A. Mandelis (North Holland, New York, 1987), chap. 5.
3. Ion implant monitoring with thermal wave technology
4. Laser‐induced photothermal reflectance investigation of silicon damaged by arsenic ion implantation: A temperature study
5. C. Christofides, in: Ion Implanted Semiconductors: Optical and Photothermal Characterization, edited by C. Christofides and G. Ghibaudo, Semiconductors and Semimetals, Vol. 46 (Academic Press, New York, 1996), chap. 4.