Fatigue‐Resistant Crosslinked Azopolymers with Inhibited H‐Aggregation for Efficient Photopatterning-Reference-Cited by-同舟云学术

Fatigue‐Resistant Crosslinked Azopolymers with Inhibited H‐Aggregation for Efficient Photopatterning

Published:2020-09-02 Issue:12 Volume:4 Page:5383-5391
ISSN:2367-0932
Container-title:ChemPhotoChem
language:en
Short-container-title:ChemPhotoChem

Author:

Yue Youfeng¹^ORCID,Azumi Reiko¹,Norikane Yasuo¹

Affiliation:

1. Research Institute for Advanced Electronics and Photonics National Institute of Advanced Industrial Science and Technology (AIST) Tsukuba Ibaraki 305-8565 Japan

Publisher

Wiley

Subject

Organic Chemistry,Physical and Theoretical Chemistry,Analytical Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/cptc.202000151

Reference53 articles.

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