Characterization of reactive DC magnetron sputtered TiAlN thin films
Author:
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Reference26 articles.
1. Mechanical and tribological properties of titanium–aluminium–nitride films deposited by reactive close-field unbalanced magnetron sputtering
2. Performance evaluation of AIP-TiAlN coated tool for high speed machining
3. Oxidation Resistance of Sputtered Ti[sub 1-x]Al[sub x]N Films for Complementary Metal Oxide Semiconductor Storage Node Electrode Barriers
4. Composite coating materials for the moulding of diffractive and refractive optical components of inorganic glasses
5. Titanium–aluminum–nitride coatings for satellite temperature control
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1. Examining the microstructure, morphological features, and wetting characteristics of Ti/TiN/TiAlN thin films produced through RF/DC magnetron co-sputtering;Materials Today Communications;2023-12
2. Tribo-mechanical performance and antibacterial activity in (Cu, Zr)-alloyed Ti(Al)N coatings synthesized by reactive magnetron sputtering;Journal of Materials Science;2022-10-14
3. Investigation of the Deposition Time Effect on the Structural, Morphological, and Mechanical Properties of TiAlN Protective Thin Films;Brazilian Journal of Physics;2022-10-04
4. Physical, electrochemical, and biocompatibility characteristics of Ti-Al-N thin film synthesized by DC pulsed magnetron sputtering;Journal of the Australian Ceramic Society;2020-04-16
5. Investigation of Titanium Aluminium Nitride (TiAlN): A Review;Lecture Notes in Electrical Engineering;2017-10-29
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