Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films-Reference-Cited by-同舟云学术

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Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Published:2013-02-21 Issue:7 Volume:45 Page:1188-1192
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Nečas David,Franta Daniel,Ohlídal Ivan¹,Poruba Aleš²,Wostrý Petr²

Affiliation:

1. Department of Physical Electronics, Faculty of Science; Masaryk University; Kotlářská 2; Brno; 61137; Czech Republic

2. Solartec s.r.o.; Televizní 2618; 756 61; Rožnov pod Radhoštěm; Czech Republic

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference40 articles.

1. Preparation and Properties of Pyrolytic Silicon Nitride

2. Some Properties of Vapor Deposited Silicon Nitride Films Using the SiH[sub 4]-NH[sub 3]-H[sub 2] System

3. The Preparation and Properties of Amorphous Silicon Nitride Films

4. Property Changes in Pyrolytic Silicon Nitride with Reactant Composition Changes

5. Properties of Si[sub x]O[sub y]N[sub z] Films on Si

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1. Optical Characterization of Inhomogeneous Thin Films Deposited onto Non-Absorbing Substrates;Coatings;2023-05-05

2. Optical characterization of inhomogeneous thin films with randomly rough boundaries exhibiting wide intervals of spatial frequencies;Optics Express;2022-10-07

3. Optical characterization of inhomogeneous thin films with randomly rough boundaries;Optics Express;2022-01-07

4. Optics of Inhomogeneous Thin Films with Defects: Application to Optical Characterization;Coatings;2020-12-27

5. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers;Optics Express;2019-12-23

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