Optimization of Thermoelectric Properties in Boron Carbide Thin Films Prepared by Ion-Beam Evaporation-Reference-Cited by-同舟云学术

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Optimization of Thermoelectric Properties in Boron Carbide Thin Films Prepared by Ion-Beam Evaporation

Published:2013-10-04 Issue: Volume: Page:199-206
ISSN:
Container-title:Surface Engineering
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Author:

Suematsu H.,Ruiz I.,Kobayashi K.,Takeda M.,Shimbo D.,Suzuki T.,Jiang W.,Yatsui K.

Publisher

John Wiley & Sons, Inc.

Reference19 articles.

1. K. Ploog “Composition and Structure of Boron Carbides Prepared by CVD,” J. Crystal Growth 24/25 (1974), 197-204

2. Characterization of Boron Carbide Thin Films Fabricated by Plasma Enhanced Chemical Vapor Deposition from Boranes;Lee;J. Appl. Phys.,1992

3. The Correlation between the Thermoelectric Properties and Stoichiometry in the Boron Carbide Phase B4C-B10.5C;Bouchacourt;J. Mater. Sci.,1985

4. Thermoelectric Properties of CVD Boron Carbide;Koumoto;Am. Ceram. Soc. Bull.,1994

5. Large Enhancement of Boron Carbides' Seebeck Coefficients through Vibrational Softening;Aselage;Phys. Rev. Lett.,1998

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