Ferroelectric Self-Poling, Switching, and Monoclinic Domain Configuration in BiFeO3Thin Films-Reference-Cited by-同舟云学术

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Ferroelectric Self-Poling, Switching, and Monoclinic Domain Configuration in BiFeO3Thin Films

Published:2016-05-23 Issue:28 Volume:26 Page:5166-5173
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Beekman C.¹,Siemons W.¹,Chi M.¹,Balke N.²,Howe J. Y.¹,Ward T. Z.¹,Maksymovych P.²,Budai J. D.¹,Tischler J. Z.³,Xu R.³,Liu W.³,Christen H. M.¹²

Affiliation:

1. Materials Science and Technology Division; Oak Ridge National Laboratory; Oak Ridge TN 37831 USA

2. Center for Nanophase Materials Science; Oak Ridge National Laboratory; Oak Ridge TN 37831 USA

3. Advanced Photon Source; Argonne National Laboratory; Argonne IL 60439 USA

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference51 articles.

1. Piezoelectric and dielectric reliability of lead zirconate titanate thin films

2. Giant Piezoelectricity on Si for Hyperactive MEMS

3. Spatial inhomogeneity of imprint and switching behavior in ferroelectric capacitors

4. A comparison of ferroelectric aging in bulk and thin‐film materials

5. Imprint and oxygen deficiency in (Pb,La)(Zr,Ti)O3 thin‐film capacitors with La‐Sr‐Co‐O electrodes

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1. The Ferroelectric Effects of Rhombohedral and Tetragonal BiFeO₃ in Photoelectrochemical Water Splitting;The Journal of Physical Chemistry Letters;2024-05-31

2. Controllable electrical, magnetoelectric and optical properties of BiFeO3 via domain engineering;Progress in Materials Science;2022-06

3. The structural and dielectric properties of Bi(Fe_0.95Sm_0.05)O₃ ceramic;Ferroelectrics;2022-02-17

4. A combined theoretical and experimental study of the phase coexistence and morphotropic boundaries in ferroelectric-antiferroelectric-antiferrodistortive multiferroics;Acta Materialia;2021-07

5. Boosting Polarization Switching-Induced Current Injection by Mechanical Force in Ferroelectric Thin Films;ACS Applied Materials & Interfaces;2021-05-26

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