Conductive Transparent TiNx/TiO2Hybrid Films Deposited on Plastics in Air Using Atmospheric Plasma Processing
Author:
Affiliation:
1. Department of Materials Science and Engineering; Stanford University; Stanford CA 94305-2205 USA
2. High Temperature Materials Unit, National Institute for Materials Science; Ibaraki 305-0047 Japan
Publisher
Wiley
Subject
Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/adfm.201303038/fullpdf
Reference33 articles.
1. Preparation and properties of TiN and AlN films from alkoxide solution by thermal plasma CVD method
2. Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition
3. Chemical Vapor Deposition of TiN from Tetrakis(dimethylamido)titanium and Ammonia: Kinetics and Mechanistic Studies of the Gas-Phase Chemistry
4. Deposition of TiN films on various substrates from alkoxide solution by plasma-enhanced CVD
5. Deposition of TiN using tetrakis(dimethylamido)‐titanium in an electron‐cyclotron‐resonance plasma process
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