Near-Field Lithography by Two-Photon Induced Photocleavage of Organic Monolayers-Reference-Cited by-同舟云学术

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Near-Field Lithography by Two-Photon Induced Photocleavage of Organic Monolayers

Published:2010-10-15 Issue:24 Volume:20 Page:4265-4272
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Álvarez Marta,Best Andreas,Unger Andreas,Alonso José M.,del Campo Aránzazu,Schmelzeisen Marcus,Koynov Kaloian,Kreiter Max

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference31 articles.

1. Principles of Nano-Optics

2. Exploitation of Localized Surface Plasmon Resonance

3. Plasmonic Materials

4. Nanostructured Plasmonic Sensors

5. A Comparative Analysis of Localized and Propagating Surface Plasmon Resonance Sensors: The Binding of Concanavalin A to a Monosaccharide Functionalized Self-Assembled Monolayer

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