Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications-Reference-Cited by-同舟云学术

Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications

Published:2019-08-15 Issue:43 Volume:29 Page:1904129
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Bergsman David S.¹^ORCID,Baker Jon G.¹,Closser Richard G.²^ORCID,MacIsaac Callisto²,Lillethorup Mie¹,Strickler Alaina L.¹,Azarnouche Laurent³,Godet Ludovic³,Bent Stacey F.¹^ORCID

Affiliation:

1. Department of Chemical Engineering Stanford University 443 Via Ortega Stanford CA 94305 USA

2. Department of Chemistry Stanford University 443 Via Ortega Stanford CA 94305 USA

3. Applied Materials 974 East Avenue, M/S 81280 Sunnyvale CA 94085 USA

Funder

National Science Foundation

U.S. Department of Energy

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adfm.201904129

Reference93 articles.

1. An overview of molecular layer deposition for organic and organic–inorganic hybrid materials: mechanisms, growth characteristics, and promising applications

2. Organic and inorganic–organic thin film structures by molecular layer deposition: A review

3. Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques

4. Hybrid nanomaterials through molecular and atomic layer deposition: Top down, bottom up, and in-between approaches to new materials

5. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

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