A Review on Dielectric Breakdown in Thin Dielectrics: Silicon Dioxide, High‐ k , and Layered Dielectrics

Author:

Palumbo Felix1ORCID,Wen Chao2,Lombardo Salvatore3,Pazos Sebastian1,Aguirre Fernando1,Eizenberg Moshe4,Hui Fei245,Lanza Mario2

Affiliation:

1. Unidad de Investigación y Desarrollo de las Ingenierías‐CONICETFacultad Regional Buenos AiresUniversidad Tecnológica Nacional (UIDI‐CONICET/FRBA‐UTN) Medrano 951 (C1179AAQ) Buenos Aires Argentina

2. Institute of Functional Nano and Soft MaterialsCollaborative Innovation Center of Suzhou Nanoscience & TechnologySoochow University 199 Ren‐Ai Road Suzhou 215123 China

3. Istituto per la Microelettronica e Microsistemi (IMM) Consiglio Nazionale delle Ricerche (CNR)Zona Industriale Ottava Strada, 5 95121 Catania Italy

4. Department of Materials Science and EngineeringTechnion–Israel Institute of Technology Haifa 32000 Israel

5. Department of Materials Science and EngineeringGuangdong Technion—Israel Institute of Technology 241 Daxue Road 515063 Shantou China

Funder

Ministerio de Ciencia, Tecnología e Innovación Productiva

Ministry of Education of the People's Republic of China

Ministry of Science and Technology of the People's Republic of China

National Natural Science Foundation of China

Ministry of Finance

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

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