Effect of Mesoporous Silica as a Solid Precursor on the Properties of Silicon Oxycarbide Thin Films via Hot Filament Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Effect of Mesoporous Silica as a Solid Precursor on the Properties of Silicon Oxycarbide Thin Films via Hot Filament Chemical Vapor Deposition

Published:2024-03-07 Issue:10 Volume:9 Page:
ISSN:2365-6549
Container-title:ChemistrySelect
language:en
Short-container-title:ChemistrySelect

Author:

Garcia Balderas Ivan Enrique¹^ORCID,Ruiz Crisoforo Morales¹^ORCID,Andres Enrique Rosendo¹,Perez Cruz Maria Ana²,Hernandez Erick Gastellou³,Galeazzi Isasmendi Reina¹^ORCID,Coyopol Solis Antonio¹,García Salgado Godofredo¹,Romano Trujillo Roman¹^ORCID

Affiliation:

1. Centro de Investigación en Dispositivos Semiconductores Benemérita Universidad Autónoma de Puebla (BUAP) Puebla, Puebla, C.P. 72570 México

2. Facultad de Ciencias Químicas Benemérita Universidad Autónoma de Puebla (BUAP) Puebla, Puebla, C. P. 72570 México

3. Departamento de investigación en física Universidad de Sonora Hermosillo Sonora, C. P. 83000 México

Abstract

AbstractThis study investigates the impact of mesoporous silica tablets on the synthesis and properties of silicon oxycarbide thin films produced via Hot Filament Chemical Vapor Deposition. Results reveal significant variations in composition and cluster morphology, influenced by the introduction of mesoporous silica tablets. The study demonstrates controlled deposition, consistent synthesis, and the substantial impact of mesoporous silica tablets on the composition, structure, and optical properties of thin films. These findings offer new possibilities for tailor design applications in electronics, optics, and sensors.

Publisher

Wiley

Reference48 articles.

1. Design of Highly Efficient Thermoelectric Materials: Tailoring Reciprocal-Space Properties by Real-Space Modification

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3. Silicon oxycarbide glasses: Part II. Structure and properties