Deposition of Au Thin Films and Nanoparticles by MOCVD-Reference-Cited by-同舟云学术

Deposition of Au Thin Films and Nanoparticles by MOCVD

Published:2012-09 Issue:10-12 Volume:18 Page:336-342
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Parkhomenko Roman G.,Morozova Natalia B.,Zharkova Galina I.,Shubin Yuri V.,Trubin Sergey V.,Kriventsov Vladimir V.,Kuchumov Boris M.,Koretskaya Tatiana P.,Igumenov Igor K.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201207004/fullpdf

Reference33 articles.

1. Interconnect Metallization Technique for GaAs Digital IC's

2. Low-Temperature Oxidation of CO over Gold Supported on TiO2, α-Fe2O3, and Co3O4

3. The reactivities of dimethylgold(III)β-diketone on the surface of TiO2 A novel preparation method for Au catalysts

4. Size- and support-dependency in the catalysis of gold

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