Investigation of the Effect of the Substrate Position Relative to the Source on the Optoelectrical and Structural Properties of Pure Nanostructured Tin Oxide by APCVD
Author:
Affiliation:
1. Department of Physics, Faculty of Science; Fouman and Shaft Branch, Islamic Azad University; Fouman (Iran)
2. CVD Lab.; Physics Department; University of Guilan; Namjoo St. Faculty of Science; Rasht (Iran)
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201407103/fullpdf
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1. In situ mass spectrometry analysis of chemical vapour deposition of TiO2 thin films to study gas phase mechanisms;RSC Advances;2016
2. Dependence of O2, N2 flow rate and deposition time on the structural, electrical and optical properties of SnO2 thin films deposited by atmospheric pressure chemical vapor deposition (APCVD);Journal of Materials Science: Materials in Electronics;2015-10-22
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