CVD Growth of MoS2-based Two-dimensional Materials-Reference-Cited by-同舟云学术

CVD Growth of MoS2-based Two-dimensional Materials

Published:2015-11-13 Issue:10-11-12 Volume:21 Page:241-259
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Liu H. F.¹,Wong S. L.¹,Chi D. Z.¹

Affiliation:

1. Institute of Materials Research and Engineering, Agency for Science, Technology and Research; 2 Fusionopolis Way; Innovis #08-03 Singapore 138634 Singapore

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference80 articles.

1. Spontaneous Ripple Formation in MoS2Monolayers: Electronic Structure and Transport Effects

2. Electric Field Effect in Atomically Thin Carbon Films

3. Two-dimensional layered materials: Structure, properties, and prospects for device applications

4. Emerging Device Applications for Semiconducting Two-Dimensional Transition Metal Dichalcogenides

5. Atomically ThinMoS2: A New Direct-Gap Semiconductor

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