Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD-Reference-Cited by-同舟云学术

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Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD

Published:2011-12 Issue:10-12 Volume:17 Page:366-374
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Thomann Anne-Lise,Vahlas Constantin,Aloui Lyacine,Samelor Diane,Caillard Amael,Shaharil Nurhul,Blanc Romuald,Millon Eric

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference24 articles.

1. Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD

2. Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures

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