FIB-SIMS quantification using TOF-SIMS with Ar and Xe plasma sources-Reference-Cited by-同舟云学术

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FIB-SIMS quantification using TOF-SIMS with Ar and Xe plasma sources

Published:2014-03-21 Issue:S1 Volume:46 Page:285-287
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Stevie F. A.¹,Sedlacek L.²,Babor P.³,Jiruse J.²,Principe E.⁴,Klosova K.²

Affiliation:

1. Analytical Instrumentation Facility; North Carolina State University; 2410 Campus Shore Drive Raleigh NC 27695 USA

2. TESCAN; Libusina trida 623 00 Brno Czech Republic

3. Central European Institute of Technology; Technicka 3058/10 CZ-616 00 Brno Czech Republic

4. TESCAN-USA; Melbourne FL USA

Funder

European Union Seventh Framework Program

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.5483/fullpdf

Reference14 articles.

1. Critical issues in the application of a gallium probe to high resolution secondary ion imaging

2. Nucleotide and protein distribution in BrdU-labelled polytene chromosomes revealed by ion probe mass spectrometry

3. ATP-dependent pHi recovery in lung macrophages: evidence for a plasma membrane H(+)-ATPase

4. Application of focused ion beam lift-out specimen preparation to TEM, SEM, STEM, AES and SIMS analysis

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