Precise Visual Inspection of LSI Wafer Patterns by Local Perturbation Pattern Matching Algorithm-Reference-Cited by-同舟云学术

Precise Visual Inspection of LSI Wafer Patterns by Local Perturbation Pattern Matching Algorithm

Published:1990 Issue:9 Volume:21 Page:99-112
ISSN:0882-1666
Container-title:Systems and Computers in Japan
language:en
Short-container-title:Syst. Comp. Jpn.

Author:

Matsuyama Yukio,Iwata Hisafumi,Kubota Hitoshi,Nonmembers Yasuo Nakagawa,

Publisher

Wiley

Subject

Computational Theory and Mathematics,Hardware and Architecture,Information Systems,Theoretical Computer Science

Reference10 articles.

1. Database inspection of wafer resist images;Fraser;Proc. SPIE,1985

2. H. Ishihara, T. Sooma, M. Misonoo, K. Takatsu, and K. Akanuma. High-speed reticle qualification system. Proc. SPIE, 772. Optical Microlithography, VI, pp. 248â255 (1987).

3. A real time image processing algorithm for visual inspection of semiconductor wafer patterns;Sakou;Trans. I.E.C.E.,1986

4. S. Fushimi, H. Kubota, Y. Hara, and Y. Nakagawa. Automated visual inspection system for aluminum patterns on LSI wafers. Proc. Kodak Microelectronics Seminar Interface '85, pp. 93â97 (1985).

5. K. Harris, P. Sandland, and R. Singleton. Automated inspection of wafer patterns with applications in stepping, projection, and direct write lithography. Solid-State Technology, pp. 159â179 (Feb. 1984).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent advances in the automatic inspection of integrated circuits for pattern defects;Machine Vision and Applications;1995-01

2. Pattern alignment method based on consistency among local registration candidates for LSI wafer pattern inspection;Sixth IEEE Workshop on Applications of Computer Vision, 2002. (WACV 2002). Proceedings.