Artifacts in AES microanalysis for semiconductor applications
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference20 articles.
1. Electron‐irradiation effect in the Auger analysis of SiO2
2. An Auger analysis of the SiO2‐Si interface
3. Photon-Induced Oxygen Loss in Thin SiO2Films
4. SiO2 surface defect centers studied by AES
5. Defect formation observed by AES in a-SiO2 films prepared by photochemical vapour deposition
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Surface elemental microanalysis with submicron lateral resolution by the laser-ablation laser-induced fluorescence technique;Optics Express;2018-05-24
2. Multi-component quantitation of meso/nanostructural surfaces and its application to local chemical compositions of copper meso/nanostructures self-organized on silica;Applied Surface Science;2018-03
3. High Temperature in situ NC-AFM, STM and AES Observations of Decomposition and Precipitation Process of Ultrathin SiO2 Films on Si(111) Substrates in Ultrahigh Vacuum;Hyomen Kagaku;2015
4. Quantitative evaluation of surface damage on SiO2/Si specimen caused by electron beam irradiation;Applied Surface Science;2005-02
5. Physical characterization of thin-film solar cells;Progress in Photovoltaics: Research and Applications;2004-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3