Application of PARAFAC2 to fault detection and diagnosis in semiconductor etch-Reference-Cited by-同舟云学术

Application of PARAFAC2 to fault detection and diagnosis in semiconductor etch

Published:2001 Issue:4 Volume:15 Page:285-298
ISSN:0886-9383
Container-title:Journal of Chemometrics
language:en
Short-container-title:J. Chemometrics

Author:

Wise Barry M.,Gallagher Neal B.,Martin Elaine B.

Publisher

Wiley

Subject

Applied Mathematics,Analytical Chemistry

Reference17 articles.

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3. Methodology for robust and sensitive fault detection. Electrochemical Society Meet., Montreal, May 1997; 97-9: 55-79.

4. A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

5. Modelling and diagnostics of batch processes and analogous kinetic experiments

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