Affiliation:
1. Chair of Electronic Devices Faculty of Electrical Engineering and Information Technology RWTH Aachen University Otto-Blumenthal-Straße 25 52074 Aachen Germany
2. Advanced Microelectronic Center Aachen (AMICA) AMO GmbH Otto-Blumenthal-Straße 25 52074 Aachen Germany
Abstract
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian‐shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography‐defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove optical noise. Following a concept proposed by Hariharan et al., a phase mask can be added to these pinholes. In theory, this modification results in a more uniform beam profile, and, if applied as spatial filters in LIL, in improved exposure and hence feature size uniformity. Here, the first successful fabrication of such elements is reported on and their use in an LIL setup is demonstrated to reduce feature dimension variations in fabricated devices.
Funder
H2020 Marie Skłodowska-Curie Actions
Subject
Pharmacology (medical),Complementary and alternative medicine,Pharmaceutical Science
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献