Robust Magnetic Proximity Induced Anomalous Hall Effect in a Room Temperature van der Waals Ferromagnetic Semiconductor Based 2D Heterostructure

Author:

Wu Hao12,Yang Li1,Zhang Gaojie123,Jin Wen1,Xiao Bichen1,Zhang Wenfeng3,Chang Haixin3ORCID

Affiliation:

1. Center for Joining and Electronic Packaging State Key Laboratory of Material Processing and Die & Mold Technology School of Materials Science and Engineering Huazhong University of Science and Technology (HUST) Wuhan 430074 China

2. Institute for Quantum Science and Engineering Huazhong University of Science and Technology (HUST) Wuhan 430074 China

3. Shenzhen R&D Center of Huazhong University of Science and Technology (HUST) Shenzhen 518000 China

Abstract

AbstractDeveloping novel high‐temperature van der Waals ferromagnetic semiconductor materials and investigating their interface coupling effects with 2D topological semimetals are pivotal for advancing next‐generation spintronic and quantum devices. However, most van der Waals ferromagnetic semiconductors exhibit ferromagnetism only at low temperatures, limiting the proximity research on their interfaces with topological semimetals. Here, an intrinsic, van der Waals layered room‐temperature ferromagnetic semiconductor crystal, FeCr0.5Ga1.5Se4 (FCGS), is reported with a Curie temperature (TC) as high as 370 K, setting a new record for van der Waals ferromagnetic semiconductors. The saturation magnetization at low temperature (2 K) and room temperature (300 K) reaches 8.2 and 2.7 emu g−1, respectively. Furthermore, FCGS possesses a bandgap of ≈1.2 eV, which is comparable to the widely used commercial silicon. The FCGS/graphene 2D heterostructure exhibits an impeccably smooth and gapless interface, thereby inducing a robust van der Waals magnetic proximity coupling effect between FCGS and graphene. After the proximity coupling, graphene undergoes a charge carrier transition from electrons to holes, accompanied by a transition from non‐magnetic to ferromagnetic transport behavior with robust anomalous Hall effect (AHE). Notably, the van der Waals magnetic proximity‐induced AHE remains robust even up to 400 K.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Natural Science Foundation of Hubei Province

China Postdoctoral Science Foundation

Publisher

Wiley

Subject

General Materials Science,General Chemistry

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