Bevel Structure Based XPS Analysis as a Non‐Destructive Chemical Probe for Complex Interfacial Structures of Organic Semiconductors-Reference-Cited by-同舟云学术

Bevel Structure Based XPS Analysis as a Non‐Destructive Chemical Probe for Complex Interfacial Structures of Organic Semiconductors

Published:2021-04-10 Issue:5 Volume:5 Page:2001264
ISSN:2366-9608
Container-title:Small Methods
language:en
Short-container-title:Small Methods

Author:

Yun Dong‐Jin¹,Lee Seunghyup²,Kim Seong Heon³,Jung Changhoon¹,Kim Yong Su¹,Chung Jae Gwan¹,Heo Sung¹,Kwon Young‐Nam¹,Lee Eunha¹,Kim Ji‐Seon⁴,Ko Dong‐Su¹,Kim Se Yun⁵^ORCID

Affiliation:

1. Autonomous Material Development Lab Samsung Advanced Institute of Technology Suwon 16678 Republic of Korea

2. Electronic Convergence Materials Division Korea Institute of Ceramic Engineering and Technology Jinju 52851 Republic of Korea

3. Department of Physics Myongji University Yongin 17058 Republic of Korea

4. Department of Physics and Centre for Processable Electronics Imperial College London London SW72AZ UK

5. Inorganic Material Lab Samsung Advanced Institute of Technology Suwon 16678 Republic of Korea

Publisher

Wiley

Subject

General Materials Science,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/smtd.202001264

Reference24 articles.

1. Metal–semiconductor contact in organic thin film transistors

2. Fabrication of fully transparent nanowire transistors for transparent and flexible electronics

3. The path to ubiquitous and low-cost organic electronic appliances on plastic

4. Damage-Free Photoemission Study of Conducting Carbon Composite Electrode Using Ar Gas Cluster Ion Beam Sputtering Process

5. Characterization techniques for nanoparticles: comparison and complementarity upon studying nanoparticle properties

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