Photo-embossed Surface Relief Structures with an Increased Aspect Ratios by Addition of a Reversible Addition-Fragmentation Chain Transfer Agent
Author:
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference27 articles.
1. Photopolymer holographic recording material
2. Relief structures in the self-developing photopolymer materials
3. Reaction–diffusion model for the preparation of polymer gratings by patterned ultraviolet illumination
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