Thickness Dependence of WO 3 and NiO x Thin Films in All‐Solid‐State Complementary Electrochromic Devices-Reference-Cited by-同舟云学术

Thickness Dependence of WO 3 and NiO x Thin Films in All‐Solid‐State Complementary Electrochromic Devices

Author:

Che Xiaoqi¹,Guo Junji²,Wang Mei¹,Wang Mengying³⁴^ORCID,Zhong Xiaolan¹,Liu Qiaoyi⁵,Dong Guobo¹,Wang Xu¹,Yang Jiaming³,Diao Xungang³⁴

Affiliation:

1. School of Physics Beihang University Beijing 100191 P. R. China

2. College of Physics and Optoelectronic Engineering Shenzhen University Shenzhen 518060 P. R. China

3. School of Energy and Power Engineering Beihang University Beijing 100191 P. R. China

4. Shen Zhen Institute of Beihang University Shenzhen 518063 P. R. China

5. Physics Department The Ohio State University Columbus OH 43210 USA

Funder

National Natural Science Foundation of China

Postdoctoral Research Foundation of China

Natural Science Foundation of Beijing Municipality

Publisher

Wiley

Subject

General Energy

Link

Reference45 articles.

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献