Measuring technological distance for patent mapping-Reference-Cited by-同舟云学术

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Measuring technological distance for patent mapping

Published:2016-03-06 Issue:2 Volume:68 Page:423-437
ISSN:2330-1635
Container-title:Journal of the Association for Information Science and Technology
language:en
Short-container-title:J Assn Inf Sci Tec

Author:

Yan Bowen¹,Luo Jianxi¹

Affiliation:

1. SUTD-MIT International Design Centre, & Engineering Product Development Pillar, Singapore University of Technology and Design; Singapore 487372

Publisher

Wiley

Subject

Library and Information Sciences,Information Systems and Management,Computer Networks and Communications,Information Systems

Reference43 articles.

1. Direct validation of citation counts as indicators of industrially important patents;Albert;Research Policy,1991

2. Analysis of patent documents with weighted association rules;Altuntas;Technological Forecasting and Social Change,2015

3. A hybrid keyword and patent class methodology for selecting relevant sets of patents for a technological field;Benson;Scientometrics,2013

4. Technology structural implications from the extension of a patent search method;Benson;Scientometrics,2015

5. Fast unfolding of communities in large networks;Blondel;Journal of Statistical Mechanics: Theory and Experiment,2008

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