Flexible and Epitaxial Metal Oxide Thin Film Growth by Photoreaction Processing for Electrical and Optical Applications-Reference-Cited by-同舟云学术

Flexible and Epitaxial Metal Oxide Thin Film Growth by Photoreaction Processing for Electrical and Optical Applications

Published:2020-07-07 Issue:42 Volume:26 Page:9261-9276
ISSN:0947-6539
Container-title:Chemistry – A European Journal
language:en
Short-container-title:Chem. Eur. J.

Author:

Tsuchiya Tetsuo¹^ORCID,Nakajima Tomohiko¹,Uzawa Yuko¹

Affiliation:

1. Advanced Coating Technology Research CenterNational Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5-2 1-1-1 Higashi Tsukuba Ibaraki 305-8565 Japan

Publisher

Wiley

Subject

General Chemistry,Catalysis,Organic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/chem.201905879

Reference79 articles.

1. Low-Temperature Processing of Ferroelectric Thin Films Compatible with Silicon Integrated Circuit Technology

2. ArF excimer laser induced CVD of aluminum oxide films

3. KrF laser CVD of titanium oxide from titanium tetraisopropoxide

4. Crystal Structure of Zirconium Oxide Deposited as Thin Films from Zr-acetylacetonate and Zr-ter-butoxide by Laser Chemical Vapor Deposition Technique

5. Selective deposition of anatase and rutile films by KrF laser chemical vapor deposition from titanium isopropoxide

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