Molecular-Level Processing of Si-(B)-C Materials with Tailored Nano/Microstructures-Reference-Cited by-同舟云学术

Molecular-Level Processing of Si-(B)-C Materials with Tailored Nano/Microstructures

Published:2017-11-08 Issue:67 Volume:23 Page:17103-17117
ISSN:0947-6539
Container-title:Chemistry - A European Journal
language:en
Short-container-title:Chem. Eur. J.

Author:

Schmidt Marion¹²,Durif Charlotte¹,Acosta Emanoelle Diz¹³,Salameh Chrystelle⁴,Plaisantin Hervé²,Miele Philippe¹,Backov Rénal⁵,Machado Ricardo³,Gervais Christel⁴,Alauzun Johan G.⁶,Chollon Georges²,Bernard Samuel¹⁷^ORCID

Affiliation:

1. IEM (Institut Europeen des Membranes), UMR 5635 (CNRS-ENSCM-UM); Universite Montpellier; Place E. Bataillon 34095 Montpellier France

2. Laboratoire des Composites ThermoStructuraux, UMR 5801, CNRS- SAFRAN Ceramics - CEA -; University of Bordeaux, 3; Allée de La Boétie 33600 Pessac France

3. Materials Engineering; Federal University of Santa Catarina; 88010-970 Florianópolis Brazil

4. Sorbonne Universités, UPMC Univ Paris 06, CNRS; Collège de France, UMR 7574, Chimie de la Matière Condensée de Paris; 75005 Paris France

5. Centre de Recherche Paul Pascal; Université de Bordeaux, UPR 8641 CNRS-115-; Avenue Albert Schweitzer 33600 Pessac France

6. Institut Charles Gerhardt Montpellier, UMR 5253, CNRS-UM-ENSCM; Université de Montpellier; Place Eugène Bataillon, CC1701 34095 Montpellier France

7. Science des Procédés Céramiques et de Traitements de Surface (SPCTS), UMR CNRS 7315; Centre Européen de la Céramique; 12 rue Atlantis 87068 Limoges Cedex France

Funder

Agence Nationale de la Recherche

Publisher

Wiley

Subject

General Chemistry,Catalysis,Organic Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/chem.201703674/fullpdf

Reference106 articles.

1. A. G. Acheson British Patent No. 17911 1892

2. Sintering of silicon carbide II. Effect of boron

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