IR absorption spectroscopy of deposition process of amorphous carbon film due to ethylene plasma-Reference-Cited by-同舟云学术

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IR absorption spectroscopy of deposition process of amorphous carbon film due to ethylene plasma

Published:2019-01-30 Issue:4 Volume:102 Page:10-17
ISSN:1942-9533
Container-title:Electronics and Communications in Japan
language:en
Short-container-title:Electron Comm Jpn

Author:

Shinohara Masanori¹,Tominaga Taisuke¹,Shimomura Hayato¹,Ihara Takeshi¹,Yagyu Yoshihito¹,Ohshima Tamiko¹,Kawasaki Hiroharu¹

Affiliation:

1. National Institute of Technology; Sasebo College; 1-1 Okishin-machi Sasebo 857-1171 Japan

Funder

Japan Society for the Promotion of Science

Publisher

Wiley

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy,Signal Processing

Link

https://onlinelibrary.wiley.com/doi/am-pdf/10.1002%2Fecj.12159

Reference13 articles.

1. Radical and film growth kinetics in methane radio-frequency glow discharges;Dagel;J Appl Phys,1996

2. Influence of ion energy and flux composition on the properties of plasma-deposited amorphous carbon and amorphous hydrogenated carbon films;Kleber;Diamond Rela Mater,1993

3. Investigations of CH4, C2H2 and C2H4 dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry;Deschenaux;J Phys D,1999

4. Temperature dependence of the sticking coefficient of methyl radicals at hydrocarbon film;Meier;J Chem Phys,2002

5. Formation of polymer-like hydrocarbon films from radical beams of methyl and atomic hydrogen;Keudell;Thin Solid Films,2002

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