P‐89: Development of 30” 4K active matrix nanoLED display using Generation 4.5 size substrate with photolithography process in the atmosphere-Reference-Cited by-同舟云学术

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P‐89: Development of 30” 4K active matrix nanoLED display using Generation 4.5 size substrate with photolithography process in the atmosphere

Published:2024-06 Issue:1 Volume:55 Page:1734-1736
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:Symp Digest of Tech Papers

Author:

Kanehiro Masayuki¹,Okamoto Shota¹,Matsushita Kazuhiko¹,Horiue Shinichi¹,Utsumi Hisayuki¹,Nakanishi Yohei¹,Nozoe Makoto²,Miyamoto Yoshinobu²,Narita Shoya²,Yamada Shigeyuki²,Nakano Takayuki²,Okabe Tohru¹,Saitoh Takao¹,Yamanaka Masaki¹,Tanaka Tetsunori¹,Kitoh Kenichi¹,Isobe Tohru¹,Iwamiya Masanori¹,Miwa Masahiko¹,Fukunari Yuki²,Kanzaki Yohsuke¹,Ishida Takeshi¹

Affiliation:

1. Sharp Display Technology Corporation Nara Japan

2. Sharp Corporation Nara Japan

Abstract

We report and discuss the challenges to realize a nanoLED based display from the perspective of materials and processes. Additionally, we report on a 30‐inch 4K active‐matrix nanoLED display using cadmium free Quantum Dots (QDs) patterned by photolithography in the atmosphere.

Publisher

Wiley

Reference26 articles.

1. Active matrix QD-LED with top emission structure by UV lithography for RGB patterning;Nakanishi;Journal of SID,2020

2. Highly efficient and stable InP/ZnSe/ZnS quantum dot light-emitting diodes

3. 58‐1: Invited Paper: Progress in High‐Efficiency Heavy‐Metal‐Free QD‐LED Development

4. Efficient and stable blue quantum dot light-emitting diode

5. High Efficiency Heavy Metal Free QD-LEDs for next Generation Displays;Ippen;Journal of SID,2019

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