P‐104: Corrugated Silicon Nitride Masks with Enhanced Mechanical Strength for Patterning RGB‐Stripe OLED Microdisplays

Author:

Dong Shou-Cheng123,Yang Jiye1,Tam Bryan Siu Ting1,Tang Ching W.4

Affiliation:

1. State Key Laboratory of Advanced Displays and Optoelectronics Technologies, Department of Electronic and Computer Engineering The Hong Kong University of Science and Technology Hong Kong

2. Institute for Advanced Study The Hong Kong University of Science and Technology Hong Kong

3. WISPO Advanced Materials (Suzhou) Co., Ltd. Suzhou China

4. Department of Chemical Engineering University of Rochester Rochester New York USA

Abstract

Corrugated silicon nitride masks (SiNMs) with improved mechanical strength are developed for patterning OLED microdisplays. The corrugations in the nitride membrane significantly increase the rigidity of the mask and reduce sagging, enabling 3000‐ppi slot apertures for patterning RGB‐stripe pixel layouts that are normally not achievable by fine metal masks.

Publisher

Wiley

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3