Mononuclear Mixedβ-Ketoester-alkoxide Compound of Titanium as a Promising Precursor for Low-Temperature MOCVD of TiO2 Thin Films-Reference-Cited by-同舟云学术

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Mononuclear Mixedβ-Ketoester-alkoxide Compound of Titanium as a Promising Precursor for Low-Temperature MOCVD of TiO2 Thin Films

Published:2003-12-17 Issue:6 Volume:9 Page:295-298
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Bhakta R.,Hipler F.,Devi A.,Regnery S.,Ehrhart P.,Waser R.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

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