The Effect of the H2Flow Rate on the Deposition of TiO2Film Produced by Inductively Coupled Plasma-Assisted CVD
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference15 articles.
1. Preparation and characterization of polycrystalline anatase and rutile TiO2 thin films by rf magnetron sputtering
2. Effect of surface structure on photocatalytic activity of TiO2 thin films prepared by sol-gel method
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4. Chemical vapour deposition of coatings
5. Microstructure modification of amorphous titanium oxide thin films during annealing treatment
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2. An Investigation into, and Improvement of, the Non-uniformity of the Flow Field caused by the Pumping Effect in a Stagnation Flow CVD Reactor;Chemical Vapor Deposition;2015-01-02
3. Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-01
4. Overviews of Synthesis of Nanomaterials;Advanced Nanomaterials and their Applications in Renewable Energy;2015
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