Study of Atmospheric MOCVD of TiO2Thin Films by Means of Computational Fluid Dynamics Simulations
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.200806708/fullpdf
Reference37 articles.
1. The surface science of titanium dioxide
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3. Metalorganic chemical vapor deposition of titanium oxide for microelectronics applications
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