Author:
Papadimitropoulos G.,Davazoglou D.
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference12 articles.
1. T. Kodas, M. Hampden-Smith, The Chemistry of Metal CVD, VCH, Weinheim 1994.
2. P. Andricacos, Interface, Spring 1999, The Electrochem. Soc., Pennington, NJ, p. 32.
3. Surface and Reactor Effects on Selective Copper Deposition from Cu(hfac)tmvs
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