Chemical Vapor Growth of NiGa2O4 Films: Advantages and Limitations of a Single Molecular Source-Reference-Cited by-同舟云学术

Chemical Vapor Growth of NiGa2O4 Films: Advantages and Limitations of a Single Molecular Source

Published:2005-01 Issue:1 Volume:11 Page:11-16
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Mathur S.,Barth S.,Shen H.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference39 articles.

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2. Handbook of Chemical Vapor Deposition: Principles, Technologies and Applications (Ed: H. O. Pierson), Noyes Publications, Park Ridge, NJ 1992.

3. Nanostructured Films and Coatings, NATO ASI Series 3, Vol. 78, (Eds: G. M. Chow, J. A. Ovid'Ko, T. Tsakalakos), Kluwer, Dordrecht, The Netherlands 2000.

4. S. Mathur, H. Shen, in Encyclopedia of Nanoscience and Nanotechnology (Ed: H. S. Nalwa), American Scientific Publishers, Stevenson Ranch, CA 2004, Vol. 4.

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